The AutoGlow 200 Etcher has been installed and is ready to use. Two process gases, Ar and O2, are available. The chamber can handle up to 8 inches wafer. With 13.56 MHz RF generator tuning from 1 Watt to 300 Watts, it is useful for
substrate cleaning before deposition or coating,
SU8 treatment for microfluidics,
PDMS activiation prior to bonding.
For more details, please check Equipment features