October 20, 2020
The AutoGlow 200 Etcher has been installed and is ready to use. Two process gases, Ar and O2, are available. The chamber can handle up to 8 inches wafer. With 13.56 MHz RF generator tuning from 1 Watt to 300 Watts, it is useful for
surface modification,
substrate cleaning before deposition or coating,
SU8 treatment for microfluidics,
PDMS activiation prior to bonding.
For more details, please check Equipment features