Equipment

Process Benches
Photoresist process bench Features: Stainless steel construction with rear exhaust Two spin processors Multiple hot plates DI waterspray gun, nitrogen gun and vacuum ports Sink with DI water Ultrasonic tank with heating Acid and Base process bench Features: Polypropylene construction with rear exhaust DI waterspray gun, nitrogen gun and vacuum ports Sink with DI water Ultrasonic tank with heating Solvent process bench Features: Stainless construction with rear exhaust DI waterspray gun, nitrogen gun and vacuum ports Sink with DI water Ultrasonic tank with heating
SUSS UV Mask Aligner
The MJB4 Mask Aligner from SUSS MicroTec is the perfect system for laboratories and small volume production. Easy to use and compact in size, the SUSS MJB4 represents an economical, highly flexible and efficient mask aligner solution for all kinds of R&D applications. It offers an excellent platform for researchers to develop new processes and technologies on a highly versatile, stateof-the-art mask aligner platform. Features: Fast and highly accurate alignment with SUSS Singlefield or Splitfield Microscope HR Optics enables high resolution prints down to 0.5μm Combined SUSS Broadband Optics (UV250/300/400) allows for fast switching between different wavelengths Wafer and substrate handling up to 100 mm Upgradable with a UV-Nano Imprint Lithography (NIL) toolkit Manufacturer product page
UHV Electron Beam Evaporator
The Electron Beam Evaporator produces extremely pure films by melting a target material using a beam of high energy electrons focused into a point. The system, from PVD Products, can reach ultra-high vacuum levels instantly with the help of cryopump and load-lock. Features: Load lock system, with main chamber at ultra high vacuum ~e-9 Torr using cryo pump. Water cooled substrate and rotation stage. Substrate tilting, able to deposit thin film at different tilted angles. Sample can be annealed at 500 °C under high vacuum level without breaking the vacuum at load lock chamber. This unique function will be the only tool at Yale. Six pockets which contain regular metals such as Au, Ag, Al, Cr, Cu, Nb, Ni, Pt and Ti. In-situ cleaning before deposition using Ar, O2, and H2. The oxygen gas can be introduced for oxidation after metal deposition. Capability to process wafers with diameter up to 4 inches.
Reactive Ion Etcher
Reactive Ion Etching is a process of transferring a pattern into a material using reactive gases. With up to 11 process gases, our PlasmaPro 100 Reactive Ion Etcher from Oxford Instruments can etch a wide variety of materials such as two-dimensional thin film, silicon, and wide band gap semiconductors with the desired features sizes, aspect ratio and depths. Features: The RIE power (300W) and ICP power (3kW) are separated to control plasma density and energy respectively. Water cooling substrate. Able to handle different materials such as GaN, GaAs, AlN, Si, and SiO2. The process gases include non-toxic CHF3, CF4, SF6, C4F8, Ar, H2, CH4 and O2, as well as toxic Cl2 and BCl3 gases. Can process wafers with diameter up to 200 mm. A load-lock is provided with a transfer arm.
Zygo 3D Optical Profiler
Nexview™ profiler represents a significant advantage over other metrology methods. A fully automated optical head makes configuration of advanced metrology applications easy, robust and repeatable. Interactive user-configurable data plots reveal surface characteristics through traditional 2D and 3D plots, as well as more advanced slope analysis, PSD, and true color imaging. Features: Excels at measuring all surfaces – from super-smooth to very rough, with sub-nanometer precision, independent of field of view. Measurement types include flatness, roughness, large steps and segments, thin films, and steep slopes, with feature heights ranging from < 1 nm up to 20000 µm. No-compromise profiling – for all types of surfaces, from rough to super smooth, including thin films, steep slopes, and large steps. Gage capable performance – exceptional precision and repeatability for the most demanding production applications. Non contact measurement, no damage for samples. Manufacturer product page
Glow Research AutoGlow 200 Etcher
AutoGlow 200 Etcher from Glow Research is a bench top and powerful etcher, which can be used in surface modification, plasma clean prior to deposition and bonding, SU8 or Biochip channel clean or treatment, PDMS activation prior to bonding. Features: 1 to 300 watts at 13.56 MHz RF generator. 10 watts for gentle processing, high power for more aggressive applications. Can set power in one watt increments. Display to show the actual power going into the chamber. With 2 Electrode Sample shelves, the system can be easily configured to top power for standard plasma processing or to bottom electrode power for RIE style processing. System designed for use with oxygen, argon or CF4 type gasses. N2 Purge, with separate nitrogen flowmeter used for adjustable for N2 purge. Can accommodate one 8” wafer or a 200mm x 200mm square substrate. Manufacturer product page
Westar Resist Spin Coater
The Westar ProSpin-6 is a smart, powerful and easy to use single wafer spin processor. Features: Fits wafers up to 6” or substrates up to 4” x 4” Programmable digital motor speed control, +/- 0.5% speed regulation, CW/CCW rotation and acceleration. Easy process recipe creation and editing on or off the system. Up to 999 steps per recipe, stores 1000s of recipes on internal compact flash or external thumb drive. Wear compensating rotary vacuum seal. Accepts vacuum or pin style chucks. Spring assisted latching lid with sensor interlock. Motor stops if lid is opened while running. Easily accessible, serviceable PTFE valve for vacuum chuck. 6.5 in. color touchscreen HMI plus keypad. Windows 7 Embedded O.S. Manufacturer product page
Olympus Optical Microscope
Olympus BX53MRF (Reflected Frame) optical microscope. Features: 5X, 10X, 20X, 50X and 100X Bright/Dark Field objective The Invisible Becomes Visible: MIX Observation Create All-in-focus Images: EFI Easily Move the Stage for Panorama: Instant MIA Capture Both Bright and Dark Areas: HDR Adaptable to Suit Observational and Analysis Preferences Accommodates a Wide Range of Samples Superior Optical Performance: Wave Front Aberration Control Stable Color Temperature and High-Intensity White LED Illumination Support Precise Measurement: Auto Calibration Seamless Stitching : Image Shading Correction Manufacturer product page
Celestron Stereo Microscope
Celestron Labs S10-60 is an all-metal bodied, low-power stereo microscope with advanced features such as high-quality glass optics, 1x and 3x objectives, 10x and 20x eyepieces and upper and lower illuminators. Features: Professional-level stereo microscope up to 60x power Two sets of 10x and 20x eyepieces Two sets of objective lenses: 1x and 3x – in-rotating housing View specimens at 10x, 20x, 30x and 60x magnification Full-metal construction with coarse focusing knob Upper and lower illumination for full range of viewing Two stage plates included: (1) transparent stage for bottom illumination and (1) black and white sides for enhanced viewing Manufacturer product page
Programmable Hotplate
Torrey Pines EchoTherm HP60A Hot Plate, Programmable Aluminum Features: Temperature range: 0 - 400 °C Heating area: 6 x 6 inch Store up to 10 programs in memory for instant recall and use Hot plate heats up to maximum temperature in approximately 2 minutes Platinum RTD temperature measurement for ±1% accuracy Repeat any program up to 98 times automatically. Multiple temperatures, temperature ramp rates, and timed events can be stored. Includes timer to 99 hours, 59 minutes with auto-off option. Unit can be programmable or non-programmable in operation. Offers RS-232 interface for control or recording data via a computer. Manufacturer product page
Regular Hotplate
Thermo Scientific™ SuperNuova+™ Hotplate Features: Temperature range: 0 - 300 °C Heat to the maximum temperature in 5 minutes Heating area: 7.25 x 7.25 inch Temperature stability of ±1.8°F (1°C) Program and save temperature and time settings for your most common applications
Oven
Fisher Scientific™ Isotemp™ General Purpose Heating and Drying Ovens Features: Model: Gravity convection Temperature range: 50° to 250°C Temperature Uniformity: ±4°C Temperature Stability: ±0.4°C Interior dimensions: 16.3 x 12.9 x 18.9 in. (414 x 328 x 480 mm) Capacity: 2.3 cu. ft.
Refrigerator
McMASTER-CARR Refrigerators for Flammables Features: Built for long-lasting safety and service, these refrigerators provide cold storage of flammable liquids in laboratory Usable dimensions: 21 in (W) x 28 in (H) x 20 in (D) Capacity: 6.1 cu. ft. Temperature: 33 - 40 °F Spec Met: CSA Certified, NFPA (National Fire Protection Agency) Code 99
Secador Desiccator
Bel-Art Secador 1.0 Desiccator with Gas Ports Features: Durastar co-polyester construction blocks 99% of UV light* and is resistant to staining, crazing and chemical attack Large doors maximize access to interior space Perforated shelves facilitate circulation of dry air; space for desiccant under bottom shelf Easy-to-view digital hygrometer is located in the door front Compact 34.1W x 41.4cmD footprint for space saving and can be stacked up to 3 units high