E-beam lithography onsite training in September

September 20, 2019

Dr. Joe Nabity from JC Nabity Lithography Systems came on September 9 ~ 12th to MCC to give us onsite training on Nanometer Pattern Generation System (NPGS). Josh Pondick from Judy Cha lab and Lei Wang as the primary NPGS system users attended this extensive three-day training.

The NPGS was incorporated into our FIB-SEM dual beam system to provide the capability of electron beam lithography at the spatial resolution as small as 20 nm. The Fracture Mode in NPGS will allow us to simplify the steps of writting several devices in single chip. Please contact us if you are interested in E-Beam Lithography.